Dongguan VILLO Technology Co., Ltd. is proud to announce a new patent for our wafer production dust removal device (Patent No. ZL2025100040318.0). This innovation addresses a critical challenge in semiconductor manufacturing: keeping wafer carriers dust-free without damaging them.
The Challenge
In modern semiconductor fabs, wafer carriers are constantly moved between stations by automated systems. Even in cleanrooms, dust can accumulate on carriers, affecting product quality and yield.
Traditional cleaning methods have limitations:
- Manual cleaning is slow and labor-intensive, often interrupting production.
- Brush-based cleaning risks scratching carriers or generating static, which can damage wafers.
The industry needed a safer, more efficient, and automated solution.
Our Solution
VILLO’s device is designed for non-contact cleaning of wafer carriers. It combines positive and negative pressure isolation with automated operation to remove dust efficiently and safely.
How it works:
- Non-contact cleaning: Airflow removes dust without touching the wafer carrier, preventing scratches and static buildup.
- Positive & negative pressure chambers: Capture and contain dust, avoiding contamination in the cleanroom.
- Automated operation: The device moves across multiple wafer carriers, cleaning efficiently with minimal human intervention.
Key Benefits
- Protects wafers and carriers – no physical contact means no damage or electrostatic risk.
- Boosts productivity – automated cleaning reduces downtime and manual labor.
- Ensures cleanroom integrity – advanced filtration and pressure isolation prevent dust from spreading.
- Sustainable design – efficient dust capture reduces waste and promotes greener manufacturing.
Why It Matters
VILLO’s device solves a critical pain point in semiconductor production: keeping wafer carriers clean while maintaining high yield and efficiency. This patented solution is ideal for fabs that demand precision, automation, and reliability.
Looking Ahead
Innovation is at the heart of VILLO. Our patented dust removal device demonstrates our commitment to green, smart, and high-performance semiconductor solutions. As fabs scale and processes become more complex, VILLO continues to deliver technologies that meet the industry’s highest standards.
For more information on our wafer production dust removal device or to learn about our other advanced semiconductor solutions, visit /solution/semiconductor/.
