Dust Control for Semiconductor

Wafer Tray Dust Removal

The wafer tray is a mechanical device installed in the front-end module that is responsible for receiving the wafer box delivered by the wafer handling equipment. It is generally used in conjunction with the load port as an interactive port between the semiconductor equipment and the production line.

In the production workshop, the FOUP is placed on the load port. Due to the high air quality requirements (ISO level 5), the clean room and process system must be cleaned regularly. The purpose is to avoid cross contamination on the silicon wafer and ultimately eliminate defects on the chip.

Solutions

Since the manufacturing processes of various wafers are extremely sophisticated and complex, the dust removal level of each process is very high. The dust removal device should have the characteristics of non-contact, fast cleaning, rapid removal of foreign matter, and easy installation.